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| Setup. | Patterns formed on a cube. | |
Three-Dimensional Resist-coating Technique Using Fine Mist
and Nanopatterning on a Si Cube
We have developed a new technique for coating resist on a three-dimensional (3D) substrate for 3D nanofabrication of various materials. A quasi-static ambient of a very fine mist of resist solution is produced using a ultrasonic nebulizer. By putting a 3D substrate in the ambient, resist film was successfully coated on it with good uniformity and small surface roughness. 3D electron beam lithography on a SiO2/Si cube produced similar patterns on each face of the cube. Moreover, a resolution 50 nm or less was confirmed by fine lines transferred to the SiO2 film. (Page 32)