 |
| 3D nanostructure in positive resist [(a), (b)] and another structure in negative resist [(c), (d)]. As each pair constitutes a stereogram, 3D images can be seen with parallel viewing. |
|
| 3D nanostructure in positive resist [(a), (b)] and another structure in negative resist [(c), (d)]. As each pair constitutes a stereogram, 3D images can be seen with parallel viewing. |
Fabrication of Three-Dimensional Nanostructures by Electron Beam Lithography
New methods in three-dimensional nanofabrication technique using electron beam (EB) lithography have been devised, promising nanotechnology applications. The accuracy of 3D positioning (i.e., 3D alignment) has been improved up to the order of 10 nm. Moreover, effective suppression of the proximity effect due to electron scattering has been achieved, enabling us to freely fabricate various 3D nanostructures. (Page 27)
[back] [Top] [Next]