Facilities of Low-Dimensional Nanomaterials Research Group

Japanese version is in preparation.

Topics:

Molecular Beam Epitaxy and Surface Spectroscopy
- Molecular Beam Epitaxy (MBE) chamber with two electron gun evaporators, four K-Cells, and RHEED
- Medium Energy Ion Scattering (MEIS) chamber coupled with an ion accelerator (350 kV).
- Electron spectroscopy chamber with Electron, X-ray, and Ultraviolet source and LEED
- Preparation chamber equipped with RHEED and a K-Cell for compound semiconductors
- Cleaning chamber with lamp heater and Ar sputter source
- load lock chamber
- sample storage chamber
High temperature furnace
- Annealing up to 1400 C in H₂, Ar, or O₂ atmosphere
Surface Reaction System
- Surface IR chamber with variable-angle mechanism and FTIR
- MBE chamber with EB gun for Si deposition and K-cells for Ge and dopant deposition and a gas inlet for hydrogen. RHEED and AES is also available.
- Gas reaction chamber with 2 gas inlet (oxygen and organic materials).
- Load lock chamber
Scanning Probe Microscopy (Nanoscope III)
- AFM in air(contact and tapping modes), STM in air, Electrochemical STM
STM system with sample preparation chamber and electron spectroscopy (Omicron)
- The system consists of UHV-STM + Si MBE + PES (XPS,UPS,AES) to study the early stage of the interface formation between semiconductors such as Si/Ge and metal/semiconductor.
Low-energy electron microscopy
- Observe surface structural changes in real time
Chemical vapor deposition for carbon nanotube growth
- Thermal CVD systems in which CH₄ and alcohol are available for carbon source gases.
- Plasma-enhanced/hot-filament CVD system for low-temperature growth of SWNT/MWNT.
Raman/PL spectroscopy
- 5 kinds of excitation lasers are available.
- In-situ measurements of CNT growth.
Electron Beam Lithography
- Used for CNT device fabrication.
Electron Beam Deposition
- Used for catalyst deposition.
Sputtering deposition
- Used for catalyst and electrode deposition

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