@Welcome to Yoshitaka Taniyasu's Homepage@@


Biography

1996 Bachelor degree from the division of Electrical and Electronic Engineering, Chiba University,
1998 Master degree from the division of Electronic and Mechanical Engineering, Chiba University,
2001
Ph.D in Engineering from Chiba University (Doctor thesis: In-situ monitoring of MOVPE growth of III-nitride semiconductors by spectroscopic ellipsometry)
2001-2003 Research associate, NTT Basic research laboratories
2003- NTT Basic research laboratories
2
010- Distinguished Technical Member of NTT Basic Research Laboratories


Research Interests

Aluminum nitride (AlN): Growth, Physics, and Device applications@
1. AlN light-emitting devices

2. High-quality AlN MOVPE growth

3. Doping control

4. Optical and electrical properties of AlN-based materials


Selected Publications

AlN p-n junction light-emitting diodes (LEDs) with the shortest emission wavelength

·           Y. Taniyasu and M. Kasu, gOrigin of exciton emissions from an AlN p-n junction light-emitting diodeh, Appl. Phys. Lett. 98, 131910 (2011).

·           Y. Taniyasu and M. Kasu, gSurface 210 nm light emission from an AlN p–n junction light-emitting diode enhanced by A-plane growth orientationh, Appl. Phys. Lett. 96, 221110 (2010).

·           Y. Taniyasu, M. Kasu, and T. Makimoto, gAn aluminium nitride light-emitting diode with a wavelength of 210 nanometresh, Nature 441, 325-328 (2006).

 

Exciton emission properties of AlN

·           R. A. R. Leute, M. Feneberg, R. Sauer, K. Thonke, S. B. Thapa, F. Scholz, Y. Taniyasu and M. Kasu, gPhotoluminescence of highly excited AlN: Biexcitons and exciton-exciton scatteringh, Appl. Phys. Lett.  95, 031903 (2009).

·           Y. Taniyasu, M. Kasu, and T. Makimoto, "Radiation and polarization properties of free-exciton emission from AlN (0001) surfaceh, Appl. Phys. Lett. 90, 261911 (2007).

·           G. M. Prinz, A. Ladenburger, M. Schirra, M. Feneberg, K. Thonke, R. Sauer, Y. Taniyasu, M. Kasu, and T. Makimoto, gCathodoluminescence, photoluminescence, and reflectance of an aluminum nitride layer grown on silicon carbide substrateh, J. Appl. Phys. 101, 023511 (2007).

 

Doping mechanisms and carrier transport properties of AlN-based materials

·           Y. Taniyasu, M. Kasu, and T. Makimoto, gIncreased electron mobility in n-type Si-doped AlN by reducing dislocation densityh, Appl. Phys. Lett. 89, 182112 (2006).

·           Y. Taniyasu, M. Kasu, and T. Makimoto, gElectrical conduction properties of n-type Si-doped AlN with high electron mobility (> 100cm2V-1S-1)h, Appl. Phys. Lett. 85, 4672 (2004).

·           Y. Taniyasu, M. Kasu, K. Kumakura, T. Makimoto, and N. Kobayashi, gHigh electron concentrations in Si-doped AlN/AlGaN superlattices with high average Al content of 80%h, phys. stat. sol. (a) 200, 40 (2003).

·           Y. Taniyasu, M. Kasu, and N. Kobayashi, gIntentional control of n-type conduction for Si-doped AlN and AlXGa1-XN (0.42 < x < 1)h, Appl. Phys. Lett. 81, 1255 (2002).

 

AlN-based cold cathode materials and it applications

·          Y. Taniyasu, M.Kasu, and T. Makimoto, gField emission properties of heavily Si-doped AlN in triode-type display structureh, Appl. Phys. Lett. 84, 2115 (2004).

·          Y. Taniyasu, M. Kasu, and N. Kobayashi, gLattice parameters of wurtzite Al1-XSiXN ternary alloysh, Appl. Phys. Lett. 79, 4351 (2001).

MOVPE growth mechanisms of nitride semiconductors

·           Y. Taniyasu, M. Kasu, and T. Makimoto, "Threading dislocations in heteroepitaxial AlN layer grown by MOVPE on SiC (0001) substrate", Journal of Crystal Growth 298, 315 (2007).

·           Y. Taniyasu and A. Yoshikawa, gIn-situ Monitoring of Surface Stoichiometry and Growth Kinetics Study of GaN (0001) in MOVPE by Spectroscopic Ellipsometryh, J. Elect. Mater. 30, 1402 (2001).

 

Nitride / Diamond heterostructure

·           K. Hirama, Y. Taniyasu, and M. Kasu, gAlGaN/GaN high-electron mobility transistors with low thermal resistance grown on single-crystal diamond (111) substrates by metalorganic vapor-phase epitaxysh, Appl. Phys. Lett. 98, 162112 (2011).

·           K. Hirama, Y. Taniyasu, and M. Kasu, gElectroluminescence and capacitance-voltage characteristics of single crystal n-type AlN (0001)/p-type diamond (111) heterojunction diodesh, Appl. Phys. Lett. 98, 011908 (2011).

·           K. Hirama, Y. Taniyasu, and M. Kasu, gHeterostructure growth of a single-crystal hexagonal AlN (0001) layer on cubic diamond (111) surfaceh, J. Appl. Phys. 108, 013528 (2010).

·           Y. Taniyasu and M. Kasu, "MOVPE growth of single-crystal hexagonal AlN on cubic diamond", Journal of Crystal Growth 311, 2825-2830 (2009).

 

Cubic InGaN LED

·           Y. Taniyasu, K. Suzuki, D. H. Lim, A. W. Jia, M. Shimotomai, Y. Kato, M. Kobayashi, A. Yoshikawa, and K. Takahashi, gCubic InGaN/GaN Double-Heterostructure Light Emitting Diodes Grown on GaAs (001) Substrates by MOVPEh, phys. stat. sol. (a) 180, 241 (2000)


Awards

u       Young Scientist Award

 gSeminal Contributions to the Growth of AlN and its Application to the Shortest Wavelength Light Emitting Diodesh

The International Symposium on Compound Semiconductors 2011

 

u       Young Scientistsf Prize

The Minister of Education, Culture, Sports, Science and Technology (MEXT), Japan in 2011

 

u       Young Scientist Award

 gFor outstanding contributions in developing and implementing Aluminum Nitride deep-ultraviolet light-emitting diodesh

14th Semiconducting and Insulating Materials Conferences (SIMC XIV)

 

u       Young Scientist Award for the Presentation of an Excellent Paper at Japan Society of Applied Physics (JSAP) meeting

Japan Society of Applied Physics (JSAP)


Research Funding

Grant-in-Aid for Young Scientists (A) from MEXT (The Ministry of Education, Culture, Sports, Science and Technology), Japan

Period: Apr. 2007 - Mar. 2010 (3 years)


Conference committee

Ø         Conference on Lasers and Electro-Optics (CLEO) 2009-2011 Program committee member

Ø         Second International Symposium on Growth of III-Nitrides (ISGN-2) Program committee member

Ø         International Workshop on Nitride Semiconductors (IWN2006) Program committee member


NTT Basic Research Laboratories
3-1 Morinosato Wakamiya, Atsugi-shi,
Kanagawa, 243-0198 JAPAN

Last modified:2011.7.14