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山崎 謙治
English version is here.
略歴
1986年に
東北大理学部物理学科を卒業、
1988年に同大学院博士前期課程を修了。同年、NTTに入社、LSI研究所に配属。
走査型トンネル顕微鏡に関する研究を始める。1996年から同基礎研究所(現物性
科学基礎研究所)にて
電子ビームナノリソグラフィの研究を行い現在に至る。2004年、東北大学から
博士の学位を受ける。
研究分野
NEMS(ナノマシン)
3次元ナノ加工
電子ビームナノリソグラフィ
走査型プローブ顕微鏡
論文/書籍
Three-Dimensional Alignmnet with 10-nm order accuracy in Electron-Beam
Lithography on Rotated Sample for Three-Dimensional Nanofabrication
Kenji Yamazaki and Hiroshi Yamaguchi
J. Vac. Sci. Technol. B Vol. 26, 2529 (2008).
Flexible Nanofabrication in Three-Dimensional Electron-Beam Lithography
Enhanced by Suppression fo Proximity Effect
Kenji Yamazaki and Hiroshi Yamaguchi
Appl. Phys. Express Vol. 1, 097001 (2008).
Chapter 10. Electron Beam Direct Writing
K. Yamazaki
"Nanofabrication: Fundamentals and Applications" Edited by A. A. Tseng,
World Scientific Publication Company (Singapore), 2008.
Modulation of Young's Modulus of Poly(methyl methacrylate) Nanobeam Due to
Electron-Beam Exposure
Kenji Yamazaki, Toru Yamaguchi, and Hiroshi Yamaguchi
Jpn. J. Appl. Phys. Vol. 46, L1225-7 (2007) (Express Letter).
Piezoresistance of Suspended InAs/AlGaSb Heterostructure Nanobeam
Kenji Yamazaki, Samir Etaki, Herre S. J. van der Zant, and Hiroshi Yamaguchi
J. Cryst. Growth, Vol. 301-302, 897-901 (2007).
Three-Dimensional Resist-Coating Technique and Nanopatterning on a
Cube Using Electron-Beam Lithography and Etching
Kenji Yamazaki and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 45, L403-5 (2006).
New Resist-Coating Technique Using Fine Mist for Three-Dimensional
Nanotechnology
Kenji Yamazaki and Hideo Namatsu
Tech. Dig. 19th IEEE MEMS, 254-7 (2006).
Three-Dimensional Nanofabrication with 10-nm Resolution
Kenji Yamazaki, Toru Yamaguchi and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 43, L1111-3 (2004).
Three-Dimensional Nanofabrication (3D-NANO) down to 10-nm Order using Electron-Beam Lithography
Kenji Yamazaki and Hideo Namatsu
Tech. Dig. 17th IEEE MEMS, 609-12 (2004).
Two-Axis-of-Rotation Drive System in Electron-Beam Lithography Apparatus for Nanotechnology Applications
Kenji Yamazaki and Hideo Namatsu
Microelectron. Eng. Vol. 73/74, 85-9 (2004).
5-nm-Order Electron-Beam Lithography for Nanodevice Fabrication
Kenji Yamazaki and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 43, 3767-71 (2004).
Electron-Beam Diameter Measurement using a Knife Edge with a Visor for Scattering Electrons
Kenji Yamazaki and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 42, L491-3 (2003).
Edge-Enhancement Writing for Electron Beam Nanolithography
Kenji Yamazaki, Toru Yamaguchi and Hideo Namatsu
Jpn. J. Appl Phys. Vol. 42, 3833-7 (2003).
Sub-10-nm Electron Beam Lithography with Sub-10-nm Overlay Accuracy
Kenji Yamazaki, Muhammad S. M. Saifullah, Hideo Namatsu and Kenji Kurihara
Proc. SPIE Vol. 3997, 458-66 (2000).
Sub-10-nm Overlay Accuracy in Electron Beam Lithography for
Nanometer-Scale Device Fabrication
Kenji Yamazaki, Akira Fujiwara, Yasuo Takahashi, Hideo Namatsu,
and Kenji Kurihara
Jpn J. Appl. Phys. Vol. 37, pp 6788-91 (1998).
Novel Proximity Effect Including Pattern-Dependent Resist
Development in Electron Beam Nanolithography
Kenji Yamazaki, Kenji Kurihara, Toru Yamaguchi, Hideo Namatsu,
and Masao Nagase
Jpn. J. Appl. Phys. Vol. 36, pp 7552-6 (1997).
Semiconductor Fabrication Process Evaluation by
Scanning Tunneling Microscopy/Atomic Force Microscopy and
Releted Techniques: Mainly Impurity Concentration Observation
Kenji Yamazaki
Inst. Phys. Conf. Ser. No 160, pp 437-48 (1997).
Impurity Concentration Measurement on MOSFET Cross-Section by
Scanning Tunneling Spectroscopy-Atomic Force Microscopy
Kenji Yamazaki
Trans. Mat. Res. Soc. Japan. Vol. 20, pp 235-8 (1996).
An Integrated Atomic Force Microscopy/Scanning Tunneling Spectroscopy
Microscope and Its Application for p-n Junction Observation
Kenji Yamazaki and Shigeru Nakajima
Jpn. J. Appl. Phys. Vol. 33, pp 3743-7 (1994).
〒243-0198
神奈川県 厚木市 森の里若宮 3-1
NTT 物性科学基礎研究所
最終更新日:2009-8-5