Kenji Yamazaki

Japanese version is here.
HOME PAGE of NTT Basic Res. Labs.

Research Interests

  • NanoElectroMechanical Systems
  • Three-dimensional Nanofabrication
  • Electron-Beam Nanolithography
  • Scanning Probe Microscopy on Semiconductors
  • Physical Property of Low Dimensional Materials

    Publication list

    Three-Dimensional Alignmnet with 10-nm order accuracy in Electron-Beam Lithography on Rotated Sample for Three-Dimensional Nanofabrication
    Kenji Yamazaki and Hiroshi Yamaguchi
    J. Vac. Sci. Technol. B Vol. 26, 2529 (2008).

    Flexible Nanofabrication in Three-Dimensional Electron-Beam Lithography Enhanced by Suppression fo Proximity Effect
    Kenji Yamazaki and Hiroshi Yamaguchi
    Appl. Phys. Express Vol. 1, 097001 (2008).

    Chapter 10. Electron Beam Direct Writing
    K. Yamazaki
    "Nanofabrication: Fundamentals and Applications" Edited by A. A. Tseng, World Scientific Publication Company (Singapore), 2008.

    Modulation of Young's Modulus of Poly(methyl methacrylate) Nanobeam Due to Electron-Beam Exposure
    Kenji Yamazaki, Toru Yamaguchi, and Hiroshi Yamaguchi
    Jpn. J. Appl. Phys. Vol. 46, L1225-7 (2007) (Express Letter).

    Piezoresistance of Suspended InAs/AlGaSb Heterostructure Nanobeam
    Kenji Yamazaki, Samir Etaki, Herre S. J. van der Zant, and Hiroshi Yamaguchi
    J. Cryst. Growth, Vol. 301-302, 897-901 (2007).

     Three-Dimensional Resist-Coating Technique and Nanopatterning on a Cube Using Electron-Beam Lithography and Etching
    Kenji Yamazaki and Hideo Namatsu
    Jpn. J. Appl. Phys. Vol. 45, L403-5 (2006).

    New Resist-Coating Technique Using Fine Mist for Three-Dimensional Nanotechnology
    Kenji Yamazaki and Hideo Namatsu
    Tech. Dig. 19th IEEE MEMS, 254-7 (2006).

    Three-Dimensional Nanofabrication with 10-nm Resolution
    Kenji Yamazaki, Toru Yamaguchi and Hideo Namatsu
    Jpn. J. Appl. Phys. Vol. 43, L1111-3 (2004).

    Three-Dimensional Nanofabrication (3D-NANO) down to 10-nm Order using Electron-Beam Lithography
    Kenji Yamazaki and Hideo Namatsu
    Tech. Dig. 17th IEEE MEMS, 609-12 (2004).

    Two-Axis-of-Rotation Drive System in Electron-Beam Lithography Apparatus for Nanotechnology Applications
    Kenji Yamazaki and Hideo Namatsu
    Microelectron. Eng. Vol. 73/74, 85-9 (2004).

     5-nm-Order Electron-Beam Lithography for Nanodevice Fabrication
    Kenji Yamazaki and Hideo Namatsu
    Jpn. J. Appl. Phys. Vol. 43, 3767-71 (2004).

    Electron-Beam Diameter Measurement using a Knife Edge with a Visor for Scattering Electrons
    Kenji Yamazaki and Hideo Namatsu
    Jpn. J. Appl. Phys. Vol. 42, L491-3 (2003).

    Edge-Enhancement Writing for Electron Beam Nanolithography
    Kenji Yamazaki, Toru Yamaguchi and Hideo Namatsu
    Jpn. J. Appl Phys. Vol. 42, 3833-7 (2003).

    Sub-10-nm Electron Beam Lithography with Sub-10-nm Overlay Accuracy
    Kenji Yamazaki, Muhammad S. M. Saifullah, Hideo Namatsu and Kenji Kurihara
    Proc. SPIE Vol. 3997, 458-66 (2000).

    Sub-10-nm Overlay Accuracy in Electron Beam Lithography for Nanometer-Scale Device Fabrication
    Kenji Yamazaki, Akira Fujiwara, Yasuo Takahashi, Hideo Namatsu, and Kenji Kurihara
    Jpn J. Appl. Phys. Vol. 37, pp 6788-91 (1998).

    Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography
    Kenji Yamazaki, Kenji Kurihara, Toru Yamaguchi, Hideo Namatsu, and Masao Nagase
    Jpn. J. Appl. Phys. Vol. 36, pp 7552-6 (1997).

     Semiconductor Fabrication Process Evaluation by Scanning Tunneling Microscopy/Atomic Force Microscopy and Releted Techniques: Mainly Impurity Concentration Observation
    Kenji Yamazaki
    Inst. Phys. Conf. Ser. No 160, pp 437-48 (1997).

    Impurity Concentration Measurement on MOSFET Cross-Section by Scanning Tunneling Spectroscopy-Atomic Force Microscopy
    Kenji Yamazaki
    Trans. Mat. Res. Soc. Japan. Vol. 20, pp 235-8 (1996).

    An Integrated Atomic Force Microscopy/Scanning Tunneling Spectroscopy Microscope and Its Application for p-n Junction Observation
    Kenji Yamazaki and Shigeru Nakajima
    Jpn. J. Appl. Phys. Vol. 33, pp 3743-7 (1994).


    Publication as a coauthor

    Biography

    He recieved B. S. in 1986, M. S. in 1988, and Ph. D. in 2004 from Tohoku university. He joined NTT LSI laboratories in 1988, and began to study on Scanning Tunneling Microscopy. Since 1996, He has studied electron-beam nanolithography in NTT Basic Research laboratories.

    NTT Basic Research Laboratories
    3-1 Morinosato Wakamiya, Atsugi-shi,
    Kanagawa, 243-0198 JAPAN

    Last modified: Aug. 2009
    HOME PAGE of NTT Basic Res. Labs.