Kenji Yamazaki
Japanese version is here.
Research Interests
NanoElectroMechanical Systems
Three-dimensional Nanofabrication
Electron-Beam Nanolithography
Scanning Probe Microscopy on Semiconductors
Physical Property of Low Dimensional Materials
Publication list
Electron Beam Lithography on Vertical Side Faces of Micrometer-oder
Si Block
Kenji Yamazaki and Hiroshi Yamaguchi
J. Vac. Sci. Technol. B. Vol. 30, Issue 4, 041601-1-6 (2012).
Resist Coating on Vertical Side Faces Using Conventional Spin Coating
for Three-Dimensional Nanostructures in Semiconductors
Kenji Yamazaki and Hiroshi Yamaguchi
Appl. Phys. Express Vol. 3, Issue 10, 106501-1-3 (2010).
Three-Dimensional Alignmnet with 10-nm order accuracy in Electron-Beam
Lithography on Rotated Sample for Three-Dimensional Nanofabrication
Kenji Yamazaki and Hiroshi Yamaguchi
J. Vac. Sci. Technol. B Vol. 26, Issue 6, 2529-33 (2008).
Flexible Nanofabrication in Three-Dimensional Electron-Beam Lithography
Enhanced by Suppression of Proximity Effect
Kenji Yamazaki and Hiroshi Yamaguchi
Appl. Phys. Express Vol. 1, Issue 9, 097001-1-3 (2008).
Chapter 10. Electron Beam Direct Writing
K. Yamazaki
"Nanofabrication: Fundamentals and Applications" Edited by A. A. Tseng,
World Scientific Publication Company (Singapore), 2008.
Modulation of Young's Modulus of Poly(methyl methacrylate) Nanobeam Due to
Electron-Beam Exposure
Kenji Yamazaki, Toru Yamaguchi, and Hiroshi Yamaguchi
Jpn. J. Appl. Phys. Vol. 46, Issue 45-49, L1225-7 (2007) (Express Letter).
Piezoresistance of Suspended InAs/AlGaSb Heterostructure Nanobeam
Kenji Yamazaki, Samir Etaki, Herre S. J. van der Zant, and Hiroshi Yamaguchi
J. Cryst. Growth, Vol. 301-302, 897-901 (2007).
Three-Dimensional Resist-Coating Technique and Nanopatterning on a
Cube Using Electron-Beam Lithography and Etching
Kenji Yamazaki and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 45, Issue 12-16, L403-5 (2006).
New Resist-Coating Technique Using Fine Mist for Three-Dimensional
Nanotechnology
Kenji Yamazaki and Hideo Namatsu
Tech. Dig. 19th IEEE MEMS, 254-7 (2006).
Three-Dimensional Nanofabrication with 10-nm Resolution
Kenji Yamazaki, Toru Yamaguchi and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 43, Issue 8B, L1111-3 (2004).
Three-Dimensional Nanofabrication (3D-NANO) down to 10-nm Order using Electron-Beam Lithography
Kenji Yamazaki and Hideo Namatsu
Tech. Dig. 17th IEEE MEMS, 609-12 (2004).
Two-Axis-of-Rotation Drive System in Electron-Beam Lithography Apparatus for Nanotechnology Applications
Kenji Yamazaki and Hideo Namatsu
Microelectron. Eng. Vol. 73/74, 85-9 (2004).
5-nm-Order Electron-Beam Lithography for Nanodevice Fabrication
Kenji Yamazaki and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 43, Issue 6B, 3767-71 (2004).
Electron-Beam Diameter Measurement using a Knife Edge with a Visor for Scattering Electrons
Kenji Yamazaki and Hideo Namatsu
Jpn. J. Appl. Phys. Vol. 42, Issue 5A, L491-3 (2003).
Edge-Enhancement Writing for Electron Beam Nanolithography
Kenji Yamazaki, Toru Yamaguchi and Hideo Namatsu
Jpn. J. Appl Phys. Vol. 42, Issue 6B, 3833-7 (2003).
Sub-10-nm Electron Beam Lithography with Sub-10-nm Overlay Accuracy
Kenji Yamazaki, Muhammad S. M. Saifullah, Hideo Namatsu and Kenji Kurihara
Proc. SPIE Vol. 3997, 458-66 (2000).
Sub-10-nm Overlay Accuracy in Electron Beam Lithography for
Nanometer-Scale Device Fabrication
Kenji Yamazaki, Akira Fujiwara, Yasuo Takahashi, Hideo Namatsu,
and Kenji Kurihara
Jpn J. Appl. Phys. Vol. 37, Issue 12B, pp 6788-91 (1998).
Novel Proximity Effect Including Pattern-Dependent Resist
Development in Electron Beam Nanolithography
Kenji Yamazaki, Kenji Kurihara, Toru Yamaguchi, Hideo Namatsu,
and Masao Nagase
Jpn. J. Appl. Phys. Vol. 36, Issue 12B, pp 7552-6 (1997).
Semiconductor Fabrication Process Evaluation by
Scanning Tunneling Microscopy/Atomic Force Microscopy and
Releted Techniques: Mainly Impurity Concentration Observation
Kenji Yamazaki
Inst. Phys. Conf. Ser. No 160, pp 437-48 (1997).
Impurity Concentration Measurement on MOSFET Cross-Section by
Scanning Tunneling Spectroscopy-Atomic Force Microscopy
Kenji Yamazaki
Trans. Mat. Res. Soc. Japan. Vol. 20, pp 235-8 (1996).
An Integrated Atomic Force Microscopy/Scanning Tunneling Spectroscopy
Microscope and Its Application for p-n Junction Observation
Kenji Yamazaki and Shigeru Nakajima
Jpn. J. Appl. Phys. Vol. 33, Issue 6B, pp 3743-7 (1994).
Biography
He recieved B. S. in 1986, M. S. in 1988, and Ph. D. in 2004
from Tohoku university.
He joined NTT LSI laboratories in 1988, and began to study on Scanning
Tunneling Microscopy. Since 1996, He has studied electron-beam
nanolithography in NTT Basic Research laboratories.
NTT Basic Research Laboratories
3-1 Morinosato Wakamiya, Atsugi-shi,
Kanagawa, 243-0198 JAPAN
Last modified: Oct. 2011