NTT Basic Research Laboratories

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Multidisciplinary Materials Design and Science Laboratory
Advanced Applied Physical Science Laboratory
Quantum Science and Technology Laboratory
Nanophotonics Center
Research Center for Theoretical Quantum Physics
February 1, 2004

Three-Dimensional Nanofabrication Using Electron Beam Lithography

NTT Basic Research Laboratory (BRL), has created an electron beam (EB) lithography system that enables the fabrication of extremely small three-dimensional (3D) structures with sizes measured in nanometers (A nanometer is a billionth of a meter). NTT demonstrated the 3D nanopatterning and nanofabrication by exposing a small shere to the EB to form the world's smallest globe. This highly advanced technique promises to become the technological foundation of nanotechnology, which is expected to give rise to many new industries and new markets.

=> Press Release
=> Nanostructure Technology Research Group