Our research activities are concentrated on the science and technology based on semiconductor nanostructures.
In particular, we developed novel fabrication process technique of semiconductor nanostructures
and studying fundamental properties of fabricated structures.
We apply molecular beam epitaxy (MBE) and electron beam (EB) lithography for the fabrication of
high-quality semiconductor nanostructures, and characterizaing the properties by
low-temperature magnet-transport measurements, scanning probe microscopes (SPM),
scanning electron microscope (SEM), etc.
Recently concentrated targets are on the three-dimensionally (3D) processed systems,
such like 3D electron beam lithography, micro/nanomechanical systems, and four-points nanoprobe systems.
The investigation of novel nanofabrication process using block-copolymer lithography
is being developed.
|
Home