Akira Fujiwara

Basic Research Laboratories
Physical Science lab.

Functional Si Nanodevice

Apr. 1, 2007-

Akira Fujiwara was born in Tokyo, Japan on March 9, 1967. He received his B.S., M.S., and Ph.D. degrees in applied physics from The University of Tokyo, Japan, in 1989, 1991, and 1994, respectively. In 1994, he joined the LSI Laboratories, Nippon Telegraph and Telephone (NTT) Corporation, Kanagawa, Japan. He moved to the Basic Research Laboratories (BRL) in 1996. Since 1994, he has been engaged in research on silicon nanostructures and their application to single-electron devices. He was a guest researcher at the National Institute of Standards and Technology (NIST), Gaithersburg, MD, USA during 2003-2004. He received the SSDM Young Researcher Award in 1998, SSDM Paper Award in 1999, and Japanese Journal of Applied Physics (JJAP) Paper Awards in 2003 and 2006. He was also awarded the Young Scientist Award from the Minister of MEXT (Ministry of Education, Culture, Sports, Science, and Technology) in 2006. He is a member of the Japan Society of Applied Physics and the IEEE.

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